3B1A and 3B1B are beamlines for LIGA and lithography separately, which both locate at III quadrant of BEPC and 13# experimental hall. They share a front end of the source and runs through time sharing. Both of them run only in the dedicated mode of synchrotron radiation.

Supported techniques:

　　  Lithography

　　  LIGA

　　 SU8

　　  Silicon etching

　　  Nano-dot lithography

Scopes:

　　  MEMS electrophoresis microchip

　　  Metal grating

　　  Heat pressuring mould

　　  EDM electrodes

　　  Metal microporous

　　  Super micro-metal structure

Beamline equipments

　　 1000-superclean lab (300m2), 100-superclean lab (10m2)

　　  Ultrapure water equipment

　　  Rusty lab

　　  Minor handicraft lab

　　  Vacuum coating

　　  Plating machine

　　 Extreme ultra violet lithography

　　 Double-sided alignment lithography machine

　　 Reactive Ion Etching

　　 Scanning electron microscope

　 　Microscope

Local Contacts

　　  Name: Futing Yi　　　　　　 Phone: 0086-10-88235983　　　　 Email: yift@ihep.ac.cn

　　  Name: Bo Wang　　　　　　Phone: 0086-10-88235983　　　　 Email: wangbo@ihep.ac.cn

Current Status: Shut down/Accepting Proposals